Title:
METHOD AND DEVICE FOR MEASURING QUANTITIES OF IMPURITIES IN SPECIAL GAS
Document Type and Number:
WIPO Patent Application WO/1992/021966
Kind Code:
A1
Abstract:
A method and a device for the quantitative measurement of impurities in special gas at a level of ultra-high purity. After inert gas of ultra-high purity is supplied to a sample-gas pipe (14) through a purifier (1) (a first gas supply source), the inside of said sample-gas pipe (14) is baked by heating means (22 to 24). Then, the inside of the sample-gas pipe (14) is kept in an atmosphere at a specified temperature and a first and second changeover valves (9, 10; 16, 17) are changed over so that a fixed quantity of special gas is supplied into the sample-gas pipe (14). Afterward, the special gas remaining in the sample-gas pipe (14) is discharged and the 1st and 2nd changeover valves (9, 10; 16, 17) are changed over so that impurities may be desorbed by baking the inside of the sample-gas pipe, and quantities of desorbed impurities are measured.
Inventors:
OHMI TADAHIRO (JP)
Application Number:
PCT/JP1992/000605
Publication Date:
December 10, 1992
Filing Date:
May 13, 1992
Export Citation:
Assignee:
OHMI TADAHIRO (JP)
International Classes:
G01N1/00; G01N13/00; G01N30/00; G01N27/62; (IPC1-7): G01N27/62; G01N30/00
Foreign References:
| JPH0247549A | 1990-02-16 | |||
| JPH0120979Y2 | 1989-06-23 | |||
| JPS5791451A | 1982-06-07 |
Other References:
See also references of EP 0651247A4
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