Title:
METHOD FOR DRYING RESIST FILM FORMED BY ELECTRODEPOSITION
Document Type and Number:
WIPO Patent Application WO/1994/017648
Kind Code:
A1
Abstract:
A method of forming a photosensitive resist film for the manufacture of finely-machined precision parts, by which dehydration and baking of a resist film can be done by a short-time heating, the resist film formed is of a resolution much higher than conventional, and thin-film drying can be performed. After the electrodeposition coating, the resist film (2) is rolled by pressure rollers (4) while being heated.
Inventors:
MATSUO SEIICHI (JP)
NAGATA KOUICHI (JP)
TANAKA SHIGEHARU (JP)
SHIMIZU MAKOTO (JP)
NAGATA KOUICHI (JP)
TANAKA SHIGEHARU (JP)
SHIMIZU MAKOTO (JP)
Application Number:
PCT/JP1994/000105
Publication Date:
August 04, 1994
Filing Date:
January 27, 1994
Export Citation:
Assignee:
NIPPON PAINT CO LTD (JP)
MATSUO SEIICHI (JP)
NAGATA KOUICHI (JP)
TANAKA SHIGEHARU (JP)
SHIMIZU MAKOTO (JP)
MATSUO SEIICHI (JP)
NAGATA KOUICHI (JP)
TANAKA SHIGEHARU (JP)
SHIMIZU MAKOTO (JP)
International Classes:
C25D13/00; G03F7/16; H01L21/027; H05K3/00; H05K3/06; (IPC1-7): H05K3/06
Foreign References:
| JPS6356988A | 1988-03-11 |
Other References:
See also references of EP 0633716A4
Download PDF:
Previous Patent: ARRANGEMENT FOR CONTINUOUS HEAT TREATMENT WITH MICROWAVE ENERGY
Next Patent: MOUNTING ASSEMBLY FOR POWER SEMICONDUCTORS
Next Patent: MOUNTING ASSEMBLY FOR POWER SEMICONDUCTORS