METHOD FOR DUPLICATING PATTERN ON CYLINDRICAL MOLD

WIPO Patent Application WO/2012/128480

A2

The present invention relates to a method for duplicating a pattern on a cylindrical mold, and more specifically, to a method for copying a pattern on a cylindrical mold for manufacturing a cylindrical mold having a pattern engraved thereon using a simple process through a direct etching without an exposure process, after duplicating the pattern onto the cylindrical mold. The method for duplicating a pattern onto a cylindrical mold of the present invention comprises: a first step for coating an ink on the pattern of an original mold; a second step for generating a pattern, through the ink coated on the pattern of the original mold being printed on a duplicate mold; and a third step for etching the portions where the pattern is not printed on the duplicate mold.

JP4215730	Methods and test forms for adjusting the exposure head in an exposed device for printed manuscripts
JP2628764	[Title of the Invention] An image forming method, an image thereof, an image forming material, and an image forming apparatus.
JPH0534900	FORMATION OF FILM MASK OF PRINTING PLATE

SHIN MYUNGDONG (KR)
KIM YUSUNG (KR)
HUR JIWON (KR)
JUNG SANGHYO (KR)

PCT/KR2012/001465

September 27, 2012

February 27, 2012

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NEW OPTICS LTD (KR)
SHIN MYUNGDONG (KR)
KIM YUSUNG (KR)
HUR JIWON (KR)
JUNG SANGHYO (KR)

B41C3/00

KR100631014B1	2006-10-04
JP2005246712A	2005-09-15
KR20080092707A	2008-10-16
KR100631016B1	2006-10-04

PARK, Junghak (KR)
박정학 (KR)

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