METHOD FOR DUPLICATING PATTERN ON CYLINDRICAL MOLD USING UV IMPRINT TECHNIQUE

WIPO Patent Application WO/2012/128482

A2

The present invention relates to a method for duplicating a pattern on a cylindrical mold using a UV imprint technique, and more specifically, to a method for duplicating a pattern on a cylindrical mold using a UV imprint technique, which enables the generation of a nano-unit pattern through a simple process, by duplicating a pattern using a UV imprint technique on a cylindrical mold. The method for duplicating a pattern on a cylindrical mold using a UV imprint technique comprises: a first step for coating a UV hardener on the pattern of an original mold, for a stamp cylinder to duplicate the pattern of the original mold while rotating in contact with the original mold, and for irradiating a UV light source on the stamp cylinder; a second step for etching the stamp cylinder duplicated with the pattern of the original mold; a third step for coating the UV hardener on the pattern of the stamp cylinder, for a duplicate mold to duplicate the pattern of the stamp cylinder while rotating in contact with the stamp cylinder, and for irradiating a UV light source on the duplicate mold and duplicating the pattern of the stamp cylinder on the duplicate mold; and a fourth step for etching the duplicate mold duplicated with the pattern of the stamp cylinder.

SHIN MYUNGDONG (KR)
KIIM YUSUNG (KR)
HUR JIWON (KR)
JUNG SANGHYO (KR)

PCT/KR2012/001468

September 27, 2012

February 27, 2012

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NEW OPTICS LTD (KR)
SHIN MYUNGDONG (KR)
KIIM YUSUNG (KR)
HUR JIWON (KR)
JUNG SANGHYO (KR)

B41C3/00; B29C59/02

KR20050114968A	2005-12-07
JP2007290274A	2007-11-08
KR20050092980A	2005-09-23
JP2002079771A	2002-03-19

PARK, Junghak (KR)
박정학 (KR)

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