METHOD FOR ELECTRODEPOSITION OF PHOTOSENSITIVE RESIST

Title:

METHOD FOR ELECTRODEPOSITION OF PHOTOSENSITIVE RESIST

Document Type and Number:

WIPO Patent Application WO/1995/004370

Kind Code:

A1

Abstract:

A method is provided for electrodeposition of a photosensitive resist film for precise lithography in a microminiature circuit process. A constant voltage of 150 to 350 V is applied, and if the logarithm of the current deviates from a given value, the energization is stopped, thus forming a film having a good adhesion and resistance to etching solution.

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Inventors:

MATSUO SEIICHI (JP)
IKEDA TAKESHI (JP)
SHIMIZU MAKOTO (JP)
KAWAMURA KAZUYUKI (JP)

Application Number:

PCT/JP1994/001221

Publication Date:

February 09, 1995

Filing Date:

July 25, 1994

Export Citation:

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Assignee:

NIPPON PAINT CO LTD (JP)
MATSUO SEIICHI (JP)
IKEDA TAKESHI (JP)
SHIMIZU MAKOTO (JP)
KAWAMURA KAZUYUKI (JP)

International Classes:

C25D13/00; G03F7/16; H01L21/027; H05K3/06; H05K3/00; (IPC1-7): H01L21/027; G03F7/16

Foreign References:

JPS6356918A

1988-03-11

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