Title:
METHOD FOR FABRICATING BARRIER RIB AND SUBSTRATE FOR ELECTROPHORETIC DISPLAY MEDIUM AND ELECTROPHORETIC DISPLAY MEDIUM
Document Type and Number:
WIPO Patent Application WO/2007/060851
Kind Code:
A1
Abstract:
A problem with a conventional method for forming a barrier rib on a substrate by
photolithography is that since a material of the substrate is different from
that of the barrier rib, their different thermal expansion coefficients and
other factors cause the substrate and the barrier rib to be separated from each
other at the interface between them. In this invention, an electrophoretic display
medium (100) comprises: a first substrate (1) and a second substrate (2) disposed
so as to be opposed to each other; a dispersion medium (7) for dispersing charged
particles (6) between the first substrate (1) and the second substrate (2); and
a barrier rib (1b) for partitioning the region between the substrates. A method
for fabricating the barrier rib (1b) and the first substrate (1) for the electrophoretic
display medium (100) includes the steps of forming an electrode, mold-pressing,
and mold-releasing, in which the barrier rib (1b) and a substrate (1a) are integrally
formed by a thermal imprint process.
Inventors:
HATTORI YASUHIRO (JP)
YOSHIMURA CHISATO (JP)
YOSHIMURA CHISATO (JP)
Application Number:
PCT/JP2006/322550
Publication Date:
May 31, 2007
Filing Date:
November 13, 2006
Export Citation:
Assignee:
BROTHER IND LTD (JP)
HATTORI YASUHIRO (JP)
YOSHIMURA CHISATO (JP)
HATTORI YASUHIRO (JP)
YOSHIMURA CHISATO (JP)
International Classes:
G02F1/167
Foreign References:
| JP2002292736A | 2002-10-09 | |||
| JP2005202245A | 2005-07-28 | |||
| JPS5828719A | 1983-02-19 | |||
| JP2001159765A | 2001-06-12 |
Other References:
See also references of EP 1953590A4
Attorney, Agent or Firm:
KITAZAWA, Kazuhiro et al. (31-14 Yushima 2-chom, Bunkyo-ku Tokyo, JP)
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