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Patent Searching and Data


Title:
METHOD FOR FABRICATING GROOVE FOR SILICA FIBER ARRAY BY USING C4F8 GAS POLYMERIZATION
Document Type and Number:
WIPO Patent Application WO/2018/034511
Kind Code:
A1
Abstract:
The present invention relates to a method for fabricating grooves for silica fiber arrays by using C4F8 gas polymerization and, more particularly, to a method for fabricating grooves for silica fiber arrays, wherein a silica substrate is used as a substrate and dry etched by using C4F8 gas polymerization to form a very precisely etched slanted surface, whereby the grooves have excellent core pitches accounting for the performance of the fiber arrays. The method for fabricating grooves for silica fiber arrays according to the present invention shows the effect that a silica substrate is used and dry etched by using C4F8 gas polymerization to form an etched slanted surface with high precision even in high-channel optical fiber arrays. In addition, the method for fabricating grooves for silica fiber arrays according to the present invention is advantageous in that the grooves for silica fiber arrays have excellent core pitches accounting for the performance of the fiber arrays.

Inventors:
KIM YOUNG BAEK (KR)
HEO GI SEOK (KR)
HA TAE WON (KR)
Application Number:
PCT/KR2017/008960
Publication Date:
February 22, 2018
Filing Date:
August 17, 2017
Export Citation:
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Assignee:
KOREA INST IND TECH (KR)
International Classes:
G02B6/02; C25D3/38; C25D5/02; G02B6/38
Foreign References:
KR20150056162A2015-05-26
KR20120055210A2012-05-31
KR20160012804A2016-02-03
KR20080062533A2008-07-03
KR20130008404A2013-01-22
Attorney, Agent or Firm:
IAM PATENT & LAW FIRM (KR)
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