METHOD FOR FABRICATING MICROMACHINE COMPONENT OF RESIN

WIPO Patent Application WO/2006/137318

A1

A method for fabricating a micromachine component of resin comprising step (a) of forming a sacrifice layer on a substrate, step (b) of forming at least two photosensitive resin composition layers sequentially on the sacrifice layer, and performing photolithography of each photosensitive resin composition layer to form an air gap portion defining the circumferential edge portion of the micromachine component and an air gap portion where an internal structure of the micromachine component is constituted to form a multilayer structure, step (c) for depositing dry film resist on the multilayer structure of the cured photosensitive resin composition layer, and performing photolithography of the dry film resist layer to form a cured dry film resist layer in which an air gap portion defining the circumferential edge of a shroud layer and an air gap where the structure of the shroud layer is constituted are formed, and step (d) for separating the micromachine component having the multilayer structure of the cured photosensitive resin composition layer and the cured dry film resist layer from the substrate by removing the sacrifice layer.

HONDA NAO (JP)
MORI SATOSHI (JP)
TANAKA SHUJI (JP)
ESASHI MASAYOSHI (JP)

PCT/JP2006/311995

December 28, 2006

June 15, 2006

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UNIV TOHOKU (JP)
NIPPON KAYAKU KK (JP)
HONDA NAO (JP)
MORI SATOSHI (JP)
TANAKA SHUJI (JP)
ESASHI MASAYOSHI (JP)

B29C67/00; B81C1/00; F04D29/22

JPH0792687A	1995-04-07
JP2004291234A	2004-10-21
JP2005171962A	2005-06-30
JP2001329993A	2001-11-30
JP2005155387A	2005-06-16

Kawaguchi, Yoshio (Yuhsen Shinjuku Gyoen Bldg. 1-11, Shinjuku 1-chome, Shinjuku-k, Tokyo 22, JP)

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