Title:
METHOD OF FEEDING ULTRAHIGH-PURITY GAS AND FEED SYSTEM THEREOF
Document Type and Number:
WIPO Patent Application WO/1993/012874
Kind Code:
A1
Abstract:
This invention relates to a method of feeding a high purity gas to process equipment operated under a reduced pressure and to a feed system thereof. The first invention relates to a method of feeding an ultrahigh-purity gas which comprises heating for at least a certain period a piping for feeding an ultrahigh-purity gas to the process equipment when the equipment for forming a film or for etching under a reduced pressure is not operated, discharging the ultrahigh-purity gas from the piping and, when the equipment is operated, stopping heating of the piping and feeding the ultrahigh-purity gas from the piping into the equipment through its inlet. In a piping system including a piping for connecting a gas inlet of equipment for forming a film or for etching under a reduced pressure with an ultrahigh-purity gas source, the second invention relates to an ultrahigh-purity gas feed system characterized by including a mechanism for discharging an impurity gas out of the piping system before it reaches a gas inlet of the equipment, and a mechanism for heating at least that part of the piping extending up to the gas inlet.
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Inventors:
OHMI TADAHIRO (JP)
Application Number:
PCT/JP1987/000466
Publication Date:
July 08, 1993
Filing Date:
July 03, 1987
Export Citation:
Assignee:
OHMI TADAHIRO (JP)
International Classes:
H01L21/302; B01J3/02; B01J4/00; C23C14/24; C23C16/44; C23C16/455; H01L21/203; H01L21/3065; (IPC1-7): B01J3/02
Foreign References:
| JPS61254241A | 1986-11-12 | |||
| JPS54142495A | 1979-11-06 |
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