Title:
METHOD FOR FORMING ALUMINUM THIN FILM , AND ALUMINUM THIN FILM THEREBY
Document Type and Number:
WIPO Patent Application WO/2017/095189
Kind Code:
A1
Abstract:
One embodiment of the present invention relates to a method for forming an aluminum thin film , and an aluminum thin film thereby . The technical purpose of the present invention is to provide a method for forming an aluminum thin film and an aluminum thin film, the method being capable of forming an aluminum thin film on a substrate made of various materials using a room temperature vacuum spray coating technique, and of implementing the original characteristics of the aluminum thin film beyond the limit of the substrate. To this end, disclosed are a method for forming an aluminum thin film and an aluminum thin film thereby, the method comprising the steps of: receiving a transfer gas from a transfer gas supply unit, receiving aluminum powder from a powder supply unit, and transferring the aluminum powder in an aerosol state; and colliding the aluminum powder transferred in the aerosol state with a substrate within a process chamber to crush the aluminum powder , thereby forming an aluminum thin film on the substrate.
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Inventors:
EOM TAE SUNG (KR)
JOUNG SUN SUB (KR)
JOUNG SUN SUB (KR)
Application Number:
PCT/KR2016/014122
Publication Date:
June 08, 2017
Filing Date:
December 02, 2016
Export Citation:
Assignee:
WELLMER CO LTD (KR)
International Classes:
C23C4/00; C23C4/06; C23C4/12; C23C4/123
Foreign References:
KR20120094294A | 2012-08-24 | |||
KR20090042569A | 2009-04-30 | |||
KR20100055887A | 2010-05-27 | |||
KR20130095535A | 2013-08-28 | |||
JP2008308702A | 2008-12-25 |
Attorney, Agent or Firm:
SUH, Man Kyu et al. (KR)
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