Title:
METHOD FOR FORMING ARTIFICIAL NAIL AND BASE MATERIAL FOR FORMING ARTIFICIAL NAIL
Document Type and Number:
WIPO Patent Application WO/2012/140796
Kind Code:
A1
Abstract:
Provided is a technique whereby an artificial nail having a high strength can be easily formed. A base material for forming an artificial nail, said base material having a widthwise cross section in a convexly curved shape and being flexible. An artificial nail is formed by applying a photo-setting resin to a wearer's own nail, putting the base material for forming an artificial nail on the wearer's own nail, adhering the base material for forming an artificial nail to the wearer's own nail, applying the photo-setting resin to the base material for forming an artificial nail that has been adhered to the wearer's own nail, and then irradiating the same with light.
Inventors:
KANADA KAORU (JP)
Application Number:
PCT/JP2011/071266
Publication Date:
October 18, 2012
Filing Date:
September 16, 2011
Export Citation:
Assignee:
KARMIN & CO LTD (JP)
KANADA KAORU (JP)
KANADA KAORU (JP)
International Classes:
A45D31/00
Foreign References:
| JP2001505105A | 2001-04-17 | |||
| JPH01228841A | 1989-09-12 | |||
| JPH09201223A | 1997-08-05 | |||
| JP2004254877A | 2004-09-16 | |||
| JP2002034641A | 2002-02-05 | |||
| JP2003210242A | 2003-07-29 |
Attorney, Agent or Firm:
KOBAYASHI Osamu et al. (JP)
Kobayashi 脩 (JP)
Kobayashi 脩 (JP)
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Claims:
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