Title:
METHOD FOR FORMING FUNCTIONAL THIN-LINE PATTERN PRECURSOR AND METHOD FOR FORMING FUNCTIONAL THIN-LINE PATTERN
Document Type and Number:
WIPO Patent Application WO/2020/161876
Kind Code:
A1
Abstract:
This method for forming a functional thin-line pattern precursor can reduce moire (interference fringe). The method for forming the functional thin-line pattern precursor comprises: forming, on a base material by a liquid applied linearly and containing a functional material, closed roughly polygonal figures which each have inner and outer edges independent of each other as edges as a result of including a region to which a liquid is not applied by the liquid including a functional material; forming a plurality of functional thin-line pattern precursors 3, 5 which comprise inner and outer thin lines containing the functional material, by drying the linearly-applied liquid and depositing the functional materials along the inner and outer edges; arranging the functional thin-line pattern precursors 3, 5 side by side; and causing maximum curvature parts provided to the outer thin lines of the functional thin-line pattern precursors 3, 5 to make contact with each other or overlap each other so as to form a single overlapping region or two overlapping regions in contact with each other.
Inventors:
NIIZUMA NAOTO (JP)
TAGORI HIROTAKA (JP)
TAGORI HIROTAKA (JP)
Application Number:
PCT/JP2019/004520
Publication Date:
August 13, 2020
Filing Date:
February 07, 2019
Export Citation:
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B05D5/00; B05D3/02; H01B5/14; H01B13/00; H05K3/10; H05K3/18
Domestic Patent References:
| WO2018110198A1 | 2018-06-21 | |||
| WO2015083160A2 | 2015-06-11 |
Foreign References:
| JP2017039109A | 2017-02-23 | |||
| JP2018098446A | 2018-06-21 | |||
| JP2018098127A | 2018-06-21 | |||
| JP2018094538A | 2018-06-21 | |||
| JP2017162739A | 2017-09-14 | |||
| JP2005152758A | 2005-06-16 |
Attorney, Agent or Firm:
MARUYAMA Eiichi (JP)
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