Title:
METHOD OF FORMING MAGNETIC PATTERN LAYER AND MAGNETIC PATTERN LAYER MANUFACTURED THEREBY
Document Type and Number:
WIPO Patent Application WO/2013/085094
Kind Code:
A1
Abstract:
The present invention provides a method of forming a magnetic pattern layer and a magnetic pattern layer manufactured thereby. The method of forming a magnetic pattern layer includes: a step of disposing a mask having a predetermined pattern on a nonmagnetic layer that has magnetism when reduced; and a step of irradiating hydrogen ions onto the nonmagnetic layer on which the mask is disposed. A portion corresponding to the mask pattern on the nonmagnetic layer is reduced by the irradiated hydrogen ions, and the periphery of a reduced region is partially reduced.
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Inventors:
HONG JONGILL (KR)
KIM SANGHOON (KR)
KIM SANGHOON (KR)
Application Number:
PCT/KR2011/010016
Publication Date:
June 13, 2013
Filing Date:
December 23, 2011
Export Citation:
Assignee:
UNIV YONSEI IACF (KR)
HONG JONGILL (KR)
KIM SANGHOON (KR)
HONG JONGILL (KR)
KIM SANGHOON (KR)
International Classes:
G11B5/62
Foreign References:
| JP2009151899A | 2009-07-09 | |||
| JP2002288813A | 2002-10-04 | |||
| US20100308012A1 | 2010-12-09 |
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (KR)
특허법인다나 (KR)
특허법인다나 (KR)
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Claims: