Title:
METHOD FOR FORMING POROUS SURFACE, METHOD FOR MANUFACTURING PHOTOCHEMICAL REACTOR, AND PHOTOCHEMICAL REACTOR
Document Type and Number:
WIPO Patent Application WO/2014/148347
Kind Code:
A1
Abstract:
Provided is a porous surface (Ef) formed by adding, to a silica dispersion liquid (Ag) containing alkoxysilane, numerous silica particles (Bm…) selected so that the particle diameter is at least 1 µm and the particle diameter is within a size range of 15% or less relative to the outer diameter of particles (3), generating a surface formation agent (E) using the sol-gel method, applying this surface formation agent (E) to the inner surfaces (2f, 3f) of a glass tube (2), then applying heat processing to the surface formation agent (E) at a prescribed fixing temperature, and fixing the silica particles (Bm…) onto the inner surfaces (2f, 3f) of the glass tube (2) in a state in which some of the silica dispersion liquid (Ag) remains.
Inventors:
USAMI HISANAO (JP)
MURAKAMI YASUSHI (JP)
MURAKAMI YASUSHI (JP)
Application Number:
PCT/JP2014/056652
Publication Date:
September 25, 2014
Filing Date:
March 13, 2014
Export Citation:
Assignee:
UNIV SHINSHU (JP)
International Classes:
B01D53/86; C01B33/12; B01J19/12; B01J19/24; B01J35/02
Domestic Patent References:
| WO2012017637A1 | 2012-02-09 |
Foreign References:
| JP2012025163A | 2012-02-09 | |||
| JP2006306708A | 2006-11-09 | |||
| JPH11319578A | 1999-11-24 |
Attorney, Agent or Firm:
SHIMODA SHIGERU (JP)
Shigeru Shimoda (JP)
Shigeru Shimoda (JP)
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