Title:
METHOD FOR FORMING REVERSE PATTERN, COMPOSITION FOR IMAGE REVERSAL AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/194838
Kind Code:
A1
Abstract:
Provided is a method for forming a reverse pattern, which comprises: (a) a step for forming an active light sensitive or radiation sensitive film using an active light sensitive or radiation sensitive resin composition; (b) a step for exposing the active light sensitive or radiation sensitive film to light; (c) a step for forming a negative pattern having a remaining film part and a space part by developing the exposed active light sensitive or radiation sensitive film by a developer liquid containing an organic solvent; (d) a step for filling the space part with a composition for image reversal by applying the composition for image reversal onto the negative pattern; and (e) a step for obtaining a reverse pattern by removing the remaining film part of the negative pattern by etching. The composition for image reversal contains a resin, and the total content ratio of silicon atoms and metal atoms in this resin is 0-20% by mass.
Inventors:
KATO KEITA (JP)
TANGO NAOHIRO (JP)
GOTO AKIYOSHI (JP)
TANGO NAOHIRO (JP)
GOTO AKIYOSHI (JP)
Application Number:
PCT/JP2016/065784
Publication Date:
December 08, 2016
Filing Date:
May 27, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/40; C08F12/24; G03F7/004; G03F7/038; G03F7/039; G03F7/20; H01L21/027
Foreign References:
| JP2014157246A | 2014-08-28 | |||
| JP2014106298A | 2014-06-09 | |||
| JP2014157299A | 2014-08-28 | |||
| JP2014157301A | 2014-08-28 | |||
| JP2015125387A | 2015-07-06 |
Attorney, Agent or Firm:
KURATA, Masatoshi et al. (JP)
Masatoshi Kurata (JP)
Masatoshi Kurata (JP)
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