METHOD FOR FORMING TRANSPARENT CONDUCTIVE FILM AND TRANSPARENT ELECTRODE

WIPO Patent Application WO/2005/059927

A1

After a dispersion liquid containing particles of a metal selected from indium, tin, antimony, aluminum and zinc, particles of an alloy composed of two or more of such metals or a mixture of such metal particles and metal alloy particles is applied to a base, the resulting is firstly fired in a vacuum atmosphere, an inert gas atmosphere or a reducing atmosphere, and then fired in an oxidizing atmosphere. After this firing in an oxidizing atmosphere, the resulting may be further fired in a reducing atmosphere. The inert gas atmosphere is an atmosphere of a gas selected from a rare gas, carbon dioxide and nitrogen, while the reducing atmosphere is an atmosphere of a gas selected from hydrogen, carbon monoxide and lower alcohols. Also disclosed is a transparent electrode composed of a transparent conductive film formed by such a method. By using such a method, a transparent conductive film having low resistance and high transmittance can be formed through low-temperature firing.

UKISHIMA SADAYUKI (JP)
TAKEI HIDEO (JP)
ISHIBASHI SATORU (JP)
ATSUKI TSUTOMU (JP)
ODA MASAAKI (JP)
YAMAGUCHI HIROSHI (JP)

PCT/JP2004/018948

June 30, 2005

December 17, 2004

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ULVAC INC (JP)
UKISHIMA SADAYUKI (JP)
TAKEI HIDEO (JP)
ISHIBASHI SATORU (JP)
ATSUKI TSUTOMU (JP)
ODA MASAAKI (JP)
YAMAGUCHI HIROSHI (JP)

B05D3/02; B05D5/12; C23C26/00; H01B13/00; G02F1/1343; H05K1/09; (IPC1-7): H01B13/00; B05D3/02; B05D5/12

JP2003249131A	2003-09-05
JP2003249126A	2003-09-05
JP2003249132A	2003-09-05

None

EXEO Patent & Trademark Company (Daishin Bldg. 2-6-2 Ebisunishi Shibuya-k, Tokyo 21, JP)

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