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Title:
METHOD FOR GROWING MONOCRYSTALLINE ALUMINUM GALLIUM NITRIDE AND MELT COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2020/161860
Kind Code:
A1
Abstract:
Provided is a method for growing monocrystalline aluminum gallium nitride. [Solution] In this melt composition, crystalline aluminum gallium nitride is grown on seed crystal by a sodium flux method. The melt composition contains sodium metal, gallium metal, and aluminum metal. In a three-component system diagram representing the composition of sodium metal, gallium metal, and aluminum metal in units of mol%, the molar ratio (Na:Ga:Al) of sodium metal, gallium metal, and aluminum metal is present in a region enclosed by a quadrangle having vertices at four points (80:15:5), (60:30:10), (47:13:40), and (67:8:25).

Inventors:
NIWA KOUSUKE (JP)
IWAI MAKOTO (JP)
HISHIKI TATSUYA (JP)
OGAWA HIROHISA (JP)
Application Number:
PCT/JP2019/004431
Publication Date:
August 13, 2020
Filing Date:
February 07, 2019
Export Citation:
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Assignee:
NGK INSULATORS LTD (JP)
International Classes:
C30B29/38; C30B19/02
Domestic Patent References:
WO2006030718A12006-03-23
Foreign References:
JP2005187317A2005-07-14
JP2005060216A2005-03-10
JP2014111541A2014-06-19
Other References:
YASUI, K. ET AL.: "Growth of AlxGal-xN and InyGal-yN Single Crystals Using the Na Flux Method", PHYSICA STATUS SOLIDI (A, vol. 188, no. 1, 2001, pages 415 - 419, XP002999861
Attorney, Agent or Firm:
HOSODA Masutoshi et al. (JP)
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