Title:
METHOD FOR IMPROVING PRECISION OF PHOTORESIST MODEL
Document Type and Number:
WIPO Patent Application WO/2023/123982
Kind Code:
A1
Abstract:
The present invention relates to the field of modeling, and in particular to a method for improving the precision of a photoresist model. The method for improving the precision of a photoresist model in the present invention comprises: first providing a convolution kernel, wherein the convolution kernel comprises a plurality of points, and each point in the convolution kernel is changeable and forms a random variable group; establishing a photoresist model on the basis of the convolution kernel; and defining every change of the random variable group as one instance of optimization, obtaining a root mean square of the corresponding model on the basis of every change of the random variable group until a preset optimization objective is reached, and recording a numerical value of the corresponding random variable group. By using a design that each point in a convolution kernel is a variable, an attempt can be made in a plurality of directions during optimization, such that an optimized photoresist model is closer to an actual model, thereby solving the problem in the prior art of a photoresist model having a low modeling precision.
Inventors:
LIANG HONGQI (CN)
Application Number:
PCT/CN2022/103125
Publication Date:
July 06, 2023
Filing Date:
June 30, 2022
Export Citation:
Assignee:
SHENZHEN JINGYUAN INFORMATION TECH CO LTD (CN)
International Classes:
G06F30/27; G06N3/04; G06N3/08
Foreign References:
| CN114330127A | 2022-04-12 | |||
| CN110824829A | 2020-02-21 | |||
| CN111581907A | 2020-08-25 | |||
| US20070224526A1 | 2007-09-27 |
Attorney, Agent or Firm:
SHENZHEN I&W INTELLECTUAL PROPERTY CORPORATION (CN)
Download PDF: