METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND METHOD FOR REMOVING IMPURITY USING SAME

WIPO Patent Application WO/2018/164522

A1

Provided are a method for manufacturing an electronic device capable of efficiently utilizing a material and a method for removing impurities using same. The method for manufacturing an electronic device comprises the steps of: placing a transfer film on a plurality of functional layers which are positioned apart from each other on a source substrate; bringing a first transfer target into close contact with the lower surface of the transfer film by applying pressure to a portion of the transfer film that corresponds to the first transfer target from among the plurality of functional layers by using a probe; separating the transfer film from the source substrate in a state in which the first transfer target is in close contact with the lower surface; placing the transfer film on a target substrate in the state in which the first transfer target is in close contact with the lower surface; placing the first transfer target on the target substrate by applying pressure to a portion of the transfer film that corresponds to the first transfer target; and separating the transfer film from the target substrate in a state in which the first transfer target is positioned on the target substrate.

LEE SANG WOOK (KR)
SHIN DONG HOON (KR)

PCT/KR2018/002798

September 13, 2018

March 09, 2018

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UNIV EWHA IND COLLABORATION (KR)

H01L51/00; H01L21/322; H01L51/05

WO2014123319A1

2014-08-14

JP2004319460A	2004-11-11
JP2004200572A	2004-07-15
KR20170011770A	2017-02-02
KR101303930B1	2013-09-05

Y.P.LEE, MOCK & PARTNERS (KR)

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