Title:
METHOD OF MANUFACTURING ENHANCED FINISH SPUTTERING TARGETS
Document Type and Number:
WIPO Patent Application WO2000013917
Kind Code:
B1
Abstract:
A method is provided for achieving an enhanced finish on a sputter target surface that results in good film uniformity, low particle counts, and little to no burn-in time. The method involves chemically etching the surface of the sputter target by immersing the surface one or more times in an etching solution, with intermediate rinsing steps. The result is a surface substantially free of mechanical deformation that exhibits a surface similar to a sputtered target with a surface roughness of 10-30 mu in.
Inventors:
JOYCE JAMES ELLIOTT
HUNT THOMAS JOHN
GILMAN PAUL SANFORD
HUNT THOMAS JOHN
GILMAN PAUL SANFORD
Application Number:
PCT/US1999/020241
Publication Date:
April 13, 2000
Filing Date:
September 02, 1999
Export Citation:
Assignee:
MATERIALS RESEARCH CORP (US)
International Classes:
B44C1/22; C23F3/00; (IPC1-7): B44C1/22; B32B3/10; C23C4/00
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