Title:
METHOD FOR MANUFACTURING GROUP-III NITRIDE LAMINATE, INSPECTION METHOD, AND GROUP-III NITRIDE LAMINATE
Document Type and Number:
WIPO Patent Application WO/2018/123285
Kind Code:
A1
Abstract:
The method for manufacturing a group-III nitride laminate according to the present invention has: a step for preparing a group-III nitride substrate and a group-III nitride laminate having a group-III nitride epitaxial layer formed on a principal face of the group-III nitride substrate; and a step for performing photoluminescence mapping measurement for a plurality of measurement positions for which the size of an off angle formed by a c-axis direction and the direction of a line normal to the principal face of the group-III nitride substrate varies, acquiring a relative yellow intensity which is the ratio of a yellow luminescence intensity with respect to a band end luminescence intensity, and acquiring a correspondence between the size of the off angle and the relative yellow intensity.
Inventors:
HORIKIRI FUMIMASA (JP)
MISHIMA TOMOYOSHI (JP)
MISHIMA TOMOYOSHI (JP)
Application Number:
PCT/JP2017/040361
Publication Date:
July 05, 2018
Filing Date:
November 09, 2017
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
SCIOCS CO LTD (JP)
UNIV HOSEI (JP)
SCIOCS CO LTD (JP)
UNIV HOSEI (JP)
International Classes:
C30B29/38; C23C16/34; C23C16/52; C30B25/20; H01L21/205; G01N21/64; G01N21/88; H01L21/20
Foreign References:
| JP2010141037A | 2010-06-24 | |||
| JP2005206424A | 2005-08-04 | |||
| JP2012165020A | 2012-08-30 | |||
| JP2002145700A | 2002-05-22 |
Attorney, Agent or Firm:
FUKUOKA Masahiro et al. (JP)
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