Title:
METHOD FOR MANUFACTURING METAL OXIDE FILM, METAL OXIDE FILM, THIN-FILM TRANSISTOR, METHOD FOR MANUFACTURING THIN-FILM TRANSISTOR, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/182679
Kind Code:
A1
Abstract:
A method for manufacturing a metal oxide film, and an application for said method, the method including: a coating step for applying a solution containing a metal nitrate and a solvent to a heated substrate using an inkjet method to form a coating film; and a conversion step for irradiating the coating film with ultraviolet rays in an atmosphere in which the oxygen concentration is 80,000 ppm or less, whereby the coating film is converted to a metal oxide film.
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Inventors:
MOCHIZUKI FUMIHIKO (JP)
TAKATA MASAHIRO (JP)
TAKATA MASAHIRO (JP)
Application Number:
PCT/JP2015/065320
Publication Date:
December 03, 2015
Filing Date:
May 27, 2015
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/368; C01B13/34; C01G15/00; H01L21/336; H01L29/786; H01L51/50; H05B33/14
Domestic Patent References:
| WO2013157715A1 | 2013-10-24 | |||
| WO2010106920A1 | 2010-09-23 |
Foreign References:
| JP2010258058A | 2010-11-11 |
Attorney, Agent or Firm:
NAKAJIMA, Jun et al. (JP)
Nakajima 淳 (JP)
Nakajima 淳 (JP)
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