Title:
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE TREATMENT DEVICE, AND PROGRAM
Document Type and Number:
WIPO Patent Application WO/2021/192207
Kind Code:
A1
Abstract:
provided a technique which includes a step for creating a recipe by setting open/close states of valves on a gas pattern screen, and a step for treating a substrate by executing the created recipe. The step for creating a recipe includes (a) a step for selecting a gas pipe on the gas pattern screen when the open/close states of arbitrary valves have changed on the gas pattern screen, and (b) a step for confirming the open/close state of a valve connected to the selected gas pipe.
Inventors:
MORI SHINICHIRO (JP)
Application Number:
PCT/JP2020/013941
Publication Date:
September 30, 2021
Filing Date:
March 27, 2020
Export Citation:
Assignee:
KOKUSAI ELECTRIC CORP (JP)
International Classes:
H01L21/31
Foreign References:
| JP2014157458A | 2014-08-28 | |||
| JP2011165959A | 2011-08-25 | |||
| JP2010102693A | 2010-05-06 | |||
| JP2009094425A | 2009-04-30 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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