Title:
METHOD FOR MANUFACTURING SUBSTRATE WITH TRANSPARENT ELECTRODE ATTACHED THEREON
Document Type and Number:
WIPO Patent Application WO/2020/189229
Kind Code:
A1
Abstract:
Provided is a method for manufacturing a substrate with a transparent electrode attached thereon in which a transparent oxide layer as a transparent electrode layer having a low resistivity can be formed on a film base. The method comprises: a transparent base oxide layer forming step for forming a transparent base oxide layer by using a sputtering method at a film formation pressure Pu and an oxygen partial pressure Pou during film formation; and a transparent conductive oxide layer forming step for forming a transparent conductive oxide layer on the transparent base oxide layer by using a sputtering method at a film formation pressure Pc and an oxygen partial pressure Poc during film formation, wherein, in the conditions in which Pu, Pc, Pou, and Poc satisfy a predetermined equation, the transparent base oxide layer and the transparent conductive oxide layer are formed, and the transparent oxide layer including the transparent base oxide layer and the transparent conductive oxide layer is formed on the film base.
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Inventors:
KUCHIYAMA TAKASHI (JP)
Application Number:
PCT/JP2020/008488
Publication Date:
September 24, 2020
Filing Date:
February 28, 2020
Export Citation:
Assignee:
KANEKA CORP (JP)
International Classes:
B32B9/00; C23C14/08; C23C14/34; H01B13/00
Domestic Patent References:
| WO2015115237A1 | 2015-08-06 |
Foreign References:
| JP2017008380A | 2017-01-12 |
Attorney, Agent or Firm:
NIIYAMA Yuichi et al. (JP)
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