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Title:
METHOD OF MARKING A SOLID-STATE MATERIAL, MARKINGS FORMED FROM SUCH METHODS AND SOLID-STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD
Document Type and Number:
WIPO Patent Application WO/2019/161791
Kind Code:
A1
Abstract:
A method of forming a non-optically detectable identifiable marking invisible to the naked eye, said marking is formed from a of plurality of recesses of multiple levels at an outer surface of an article formed from a solid-state material, and said method including the steps of: forming a plurality of recesses of multiple levels within a predetermined region of a photoresist applied to an outer surface of an article formed from a solid-state material, wherein said plurality of recesses of multiple levels is formed by grayscale lithography and wherein said one or more recesses extend at least partially through the photoresist and towards said outer surface of the article formed from a solid-state material; and applying an etching process such that at least a portion of the outer surface of said article is exposed and etched so as to form a plurality of etched portions extending into said article from the outer surface of the article and corresponding to said plurality of recesses; wherein said predetermined region of said photoresist defines an identifiable marking to be applied to the outer surface of said article; wherein said plurality of etched portions forms the non-optically identifiable marking on the outer surface of said article.

Inventors:
LUI SIU LUNG (CN)
WANG YINGNAN (CN)
HUANG JIANXING (CN)
Application Number:
PCT/CN2019/075953
Publication Date:
August 29, 2019
Filing Date:
February 22, 2019
Export Citation:
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Assignee:
MASTER DYNAMIC LTD (CN)
International Classes:
B44C1/22; B28D5/00
Domestic Patent References:
WO2016054996A12016-04-14
Foreign References:
US20170182838A12017-06-29
US20030120613A12003-06-26
CN102866580A2013-01-09
CN101512548A2009-08-19
GB2332651A1999-06-30
US20170182838A12017-06-29
US20080006615A12008-01-10
Other References:
See also references of EP 3625060A4
Attorney, Agent or Firm:
CHINA SINDA INTELLECTUAL PROPERTY LIMITED (CN)
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