Title:
METHOD OF ORGANIC FILM DEPOSITION
Document Type and Number:
WIPO Patent Application WO/1999/066351
Kind Code:
A1
Abstract:
A method of organic deposition comprises a first step of supporting a substrate on which a scintillator is formed using at least three sample support needles rising from a turntable, a second step of introducing the turntable supporting the substrate into a CVD chamber, and a third step of depositing organic CVD film over the entire surface of the substrate including the scintillator formed on it.
Inventors:
HOMME TAKUYA (JP)
TAKABAYASHI TOSHIO (JP)
SATO HIROTO (JP)
TAKABAYASHI TOSHIO (JP)
SATO HIROTO (JP)
Application Number:
PCT/JP1999/003269
Publication Date:
December 23, 1999
Filing Date:
June 18, 1999
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
HOMME TAKUYA (JP)
TAKABAYASHI TOSHIO (JP)
SATO HIROTO (JP)
HOMME TAKUYA (JP)
TAKABAYASHI TOSHIO (JP)
SATO HIROTO (JP)
International Classes:
B05D7/24; C08L67/02; C23C16/00; C30B25/02; C30B29/12; C30B29/54; C30B33/00; G01T1/00; G01T1/20; G03B42/02; G21K4/00; (IPC1-7): G01T1/20
Foreign References:
| JPS63215987A | 1988-09-08 | |||
| JPH0913172A | 1997-01-14 | |||
| JPH0848595A | 1996-02-20 |
Other References:
See also references of EP 1118880A4
Attorney, Agent or Firm:
Hasegawa, Yoshiki (Ginza 2-chome Chuo-ku Tokyo, JP)
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