Title:
METHOD FOR OXIDE FILM FORMATION AND APPARATUS FOR THE METHOD
Document Type and Number:
WIPO Patent Application WO/2008/023748
Kind Code:
A1
Abstract:
This invention provides an apparatus (1) for oxide film formation. In the apparatus
(1), light in an ultraviolet light range is applied to a substrate (7), and, at
the same time, a starting gas (G1) of an organosilicon and an ozone gas (G2) are
fed to the substrate (7) to form an oxide film on the surface of the substrate (7).
The substrate (7) is housed in a treatment furnace (2). A pipe (3) functions to
mix the starting gas (G1) and the ozone gas (G2) together at room temperature to
prepare a mixture which is then fed into the substrate (7) in the treatment furnace
(2). A light source (5) emits and applies light having a wavelength longer than
210 nm in an ultraviolet range to the substrate (7). The amount of the ozone gas
(G2) mixed in the starting gas (G1) fed into the pipe (3) is set to a value which is
at least a chemical equivalent or more necessary for totally oxidizing the starting
gas (G1). According to the apparatus (1) for oxide film formation, the utilization
efficiency of the starting gas is enhanced, and, at the same time, an oxide film
having excellent electric characteristics can be formed by a film formation
process at 200°C or below.
Inventors:
NISHIGUCHI TETSUYA (JP)
KAMEDA NAOTO (JP)
SAITOU SHIGERU (JP)
NONAKA HIDEHIKO (JP)
ICHIMURA SHINGO (JP)
KAMEDA NAOTO (JP)
SAITOU SHIGERU (JP)
NONAKA HIDEHIKO (JP)
ICHIMURA SHINGO (JP)
Application Number:
PCT/JP2007/066312
Publication Date:
February 28, 2008
Filing Date:
August 22, 2007
Export Citation:
Assignee:
MEIDENSHA ELECTRIC MFG CO LTD (JP)
NAT INST OF ADVANCED IND SCIEN (JP)
NISHIGUCHI TETSUYA (JP)
KAMEDA NAOTO (JP)
SAITOU SHIGERU (JP)
NONAKA HIDEHIKO (JP)
ICHIMURA SHINGO (JP)
NAT INST OF ADVANCED IND SCIEN (JP)
NISHIGUCHI TETSUYA (JP)
KAMEDA NAOTO (JP)
SAITOU SHIGERU (JP)
NONAKA HIDEHIKO (JP)
ICHIMURA SHINGO (JP)
International Classes:
H01L21/316; C23C16/42; H01L21/31; H01L21/336; H01L29/786
Foreign References:
| JP2002075988A | 2002-03-15 | |||
| JPH04188622A | 1992-07-07 | |||
| JPH04180226A | 1992-06-26 |
Attorney, Agent or Firm:
HASHIMOTO, Takeshi et al. (Ekisaikai Bldg.1-29, Akashi-ch, Chuo-ku Tokyo 44, JP)
Download PDF: