Title:
METHOD FOR PATTERNING QUANTUM DOTS
Document Type and Number:
WIPO Patent Application WO/2022/110031
Kind Code:
A1
Abstract:
A method for patterning quantum dots, comprising the following steps: (1) dissolving a quantum dot precursor in a non-polar solvent, and printing the resulting precursor solution on a substrate to form a precursor pattern; and (2) subjecting the precursor pattern in step (1) to a reaction to form a quantum dot pattern.
Inventors:
SUN XIAOWEI (CN)
FANG FAN (CN)
ZHANG ZHIKUAN (CN)
WANG KAI (CN)
FANG FAN (CN)
ZHANG ZHIKUAN (CN)
WANG KAI (CN)
Application Number:
PCT/CN2020/132302
Publication Date:
June 02, 2022
Filing Date:
November 27, 2020
Export Citation:
Assignee:
SHENZHEN PLANCK INNOVATION TECH CO LTD (CN)
International Classes:
B41J2/01; C09K11/66; C09D11/38
Foreign References:
| CN110808316A | 2020-02-18 | |||
| CN111490144A | 2020-08-04 | |||
| CN110105953A | 2019-08-09 | |||
| CN108101381A | 2018-06-01 | |||
| JP2019215516A | 2019-12-19 |
Attorney, Agent or Firm:
BEYOND ATTORNEYS AT LAW (CN)
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