METHOD FOR PRODUCING COMPOSITION FOR FORMING PROTECTIVE LAYER, METHOD FOR PRESERVING COMPOSITION FOR FORMING PROTECTIVE LAYER, AND PRACTICAL APPLICATION OF PRESERVATION METHOD

WIPO Patent Application WO/2020/262282

A1

Provided is a method for producing a composition for forming a protective layer, the composition being layered on an organic layer and being used in forming a water-soluble protective layer for protecting the organic layer from liquid chemicals, and the method being such that: after a composition including a water-soluble resin and a solvent has been stirred, the method includes continuously exposing a container into which the stirred composition was charged to an environment in a temperature range of 0-18°C for 24 hours or longer; and the start time of the period of exposure to the aforementioned environment is within 72 hours after completion of stirring. Also provided are a method for preserving a composition for forming a protective layer, and a practical application of the preservation method.

TAKAKUWA HIDEKI (JP)
SHIMADA KAZUTO (JP)
ENOMOTO YUICHIRO (JP)

PCT/JP2020/024329

December 30, 2020

June 22, 2020

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FUJIFILM CORP (JP)

B32B27/18; A01N33/18; A01N37/02; A01N41/10; A01N43/38; A01N43/40; A01N43/80; A01P3/00; C08J7/04; C08K5/00; C08L101/14; G03F7/038; G03F7/039; G03F7/11; G03F7/20; H01L21/027; H01L21/312

WO2016175220A1

2016-11-03

JP2014187249A	2014-10-02
JPH0768683A	1995-03-14
US20080044635A1	2008-02-21
CN105348552A	2016-02-24
JPH0511405A	1993-01-22
JP2018513811A	2018-05-31

SIKs & Co. (JP)

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