Title:
METHOD FOR PRODUCING CURED FILM, AND CURED FILM
Document Type and Number:
WIPO Patent Application WO/2016/208479
Kind Code:
A1
Abstract:
Provided are: a method for producing a cured film, whereby it becomes possible to produce a cured film having excellent reliability by a low-temperature process; and a cured film. A method for producing a cured film, comprising a step of irradiating a layer that is provided on a base material and is made from an active energy ray-curable composition with an electron beam having an accelerating voltage of 10 kV or more and less than 100 kV, wherein the operations throughout the process are carried out at a temperature of 100°C or lower.
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Inventors:
YOSHIBAYASHI MITSUJI (JP)
Application Number:
PCT/JP2016/067877
Publication Date:
December 29, 2016
Filing Date:
June 16, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
B29C35/08; G02B5/20; H01L51/50; H05B33/12
Foreign References:
| JPH10237356A | 1998-09-08 | |||
| JP2009244689A | 2009-10-22 | |||
| JPH10158413A | 1998-06-16 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Patent business corporation patent firm Sykes (JP)
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