METHOD FOR PRODUCING FINE SILVER PARTICLES - DOWA ELECTRONICS MATERIALS CO

Title:

METHOD FOR PRODUCING FINE SILVER PARTICLES

Document Type and Number:

WIPO Patent Application WO/2014/054550

Kind Code:

A1

Abstract:

Provided is a method for producing fine silver particles, which is capable of producing fine silver particles in a short period of time at low cost by adding, into water that serves as a solvent, a silver compound such as a silver salt or silver oxide (so that the silver ion concentration in an aqueous reaction solution is 0.01-1.0 mol/L), while adding an aliphatic amine having 6 or more carbon atoms such as octyl amine, hexyl amine or oleyl amine that serves as an organic protective agent (so that the molar ratio thereof to the silver in the silver compound is 0.05-6) and adding a reducing agent such as hydrazine or NaBH4 (so that the molar ratio thereof to the silver in the silver compound is 1-6), so that the silver compound is reduced at a temperature of 10-50°C, thereby producing fine silver particles having an average primary particle diameter of 10-200 nm.

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Inventors:

SHIBAYAMA TOMONORI (JP)
HINOTSU TAKASHI (JP)
KARIYASU TATUYA (JP)

Application Number:

PCT/JP2013/076449

Publication Date:

April 10, 2014

Filing Date:

September 20, 2013

Export Citation:

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Assignee:

DOWA ELECTRONICS MATERIALS CO (JP)

International Classes:

B22F9/24

Domestic Patent References:

WO2010073420A1

2010-07-01

Foreign References:

JP2010209407A	2010-09-24
JP2012162772A	2012-08-30
JP2007039718A	2007-02-15

Other References: