Title:
METHOD FOR PRODUCING GAS BARRIER FILM, AND GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2016/136935
Kind Code:
A1
Abstract:
A method for producing a gas barrier film, wherein: a gas barrier laminate is formed by laminating an atomic layer deposited film on the surface of a plastic base by an atomic layer deposition method; an overcoat laminate is formed by removably laminating a curable resin layer on a supporting body; the gas barrier laminate and the overcoat laminate are laminated on each other such that the atomic layer deposited film and the curable resin layer face each other, and the curable resin layer is transferred onto the atomic layer deposited film; and the curable resin layer is cured by means of application of heat or an active energy ray, and the curable resin layer is separated from the supporting body.
Inventors:
TAKASHIMA NAO (JP)
Application Number:
PCT/JP2016/055783
Publication Date:
September 01, 2016
Filing Date:
February 26, 2016
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD (JP)
International Classes:
B32B38/18; B32B9/00; C23C16/44; C23C16/455
Domestic Patent References:
| WO2014156888A1 | 2014-10-02 | |||
| WO2013015417A1 | 2013-01-31 | |||
| WO2015087949A1 | 2015-06-18 |
Foreign References:
| JP2013502745A | 2013-01-24 |
Other References:
See also references of EP 3263337A4
Attorney, Agent or Firm:
SUZUKI Shirou et al. (JP)
Shiro Suzuki (JP)
Shiro Suzuki (JP)
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