Title:
METHOD FOR PRODUCING GRAPHENE FILM
Document Type and Number:
WIPO Patent Application WO/2015/060419
Kind Code:
A1
Abstract:
Provided is a method for producing a graphene film, which does not deteriorate the characteristics of a graphene film because of a residue of a supporting film or the like. This method for producing a graphene film comprises a first step for forming a first graphene film (12) on a first substrate (10). After that, a supporting film (14) is coated onto the first graphene film (12); the first substrate (10) is removed, so that the first graphene film (12) is supported by the supporting film (14); a second graphene film (18) is formed on a second substrate (16); the first graphene film (12) supported by the supporting film (14) is transferred to the second graphene film (18) formed on the second substrate (16), so that the first graphene film (12) is laminated on the second graphene film (18); the second substrate (16) is removed, so that the laminated graphene films (12, 18) are supported by the supporting film (14); the laminated graphene films (12, 18) are transferred onto a third substrate (28); and the supporting film (14) is removed, so that the laminated graphene films (12, 18) are disposed on the third substrate (28).
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Inventors:
HAYASHI KENJIRO (JP)
Application Number:
PCT/JP2014/078318
Publication Date:
April 30, 2015
Filing Date:
October 24, 2014
Export Citation:
Assignee:
FUJITSU LTD (JP)
International Classes:
C01B31/02
Foreign References:
| JP2013043820A | 2013-03-04 | |||
| JP2013159521A | 2013-08-19 | |||
| JP2011105590A | 2011-06-02 | |||
| JP2011006265A | 2011-01-13 | |||
| JP2009200177A | 2009-09-03 | |||
| JP2011051801A | 2011-03-17 |
Attorney, Agent or Firm:
KITANO, Yoshihito (JP)
Kitano Yoshito (JP)
Kitano Yoshito (JP)
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