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Title:
METHOD FOR PRODUCING HIGH-PURITY ELECTROLYTIC COPPER
Document Type and Number:
WIPO Patent Application WO/2018/221734
Kind Code:
A1
Abstract:
This method for producing high-purity electrolytic copper is characterized in that: a first additive (A) which contains an aromatic ring of a hydrophobic group and a polyoxyalkylene group of a hydrophilic group, a second additive (B) comprising a polyvinyl alcohol, and a third additive (C) comprising a tetrazole are added to a copper electrolyte; copper electrolysis is performed by controlling the concentrations of the first additive (A), the second additive (B), and the third additive (C), and by controlling the electric current density and the bath temperature; and as a result, electrolytic copper is produced which exhibits an Ag concentration of less than 0.2 mass ppm, an S concentration of less than 0.07 mass ppm, a total impurity concentration of less than 0.2 mass ppm, and no more than 10% by area ratio of crystal particles exhibiting a grain orientation spread (GOS value) greater than 2.5°.

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Inventors:
TARUTANI YOSHIE (JP)
KUBOTA KENJI (JP)
NAKAYA KIYOTAKA (JP)
ARAI ISAO (JP)
Application Number:
PCT/JP2018/021228
Publication Date:
December 06, 2018
Filing Date:
June 01, 2018
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP (JP)
International Classes:
C25C1/12
Foreign References:
US20170088963A12017-03-30
JPH02185990A1990-07-20
JP2001123289A2001-05-08
JP2017043834A2017-03-02
JP2017109244A2017-06-22
JP2017110418A2017-06-22
JP2018097319A2018-06-21
JP2018097318A2018-06-21
JPH08990B21996-01-10
JP2001123289A2001-05-08
JP2005307343A2005-11-04
JP2017043834A2017-03-02
JP2017066514A2017-04-06
Other References:
TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS (A, vol. 71, no. 712, December 2005 (2005-12-01), pages 1722 - 1728
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
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