Title:
METHOD OF PRODUCING HOLLOW PARTICLES, METHOD OF PRODUCING ANTIREFLECTION COATING, AND METHOD OF PRODUCING OPTICAL ELEMENT
Document Type and Number:
WIPO Patent Application WO/2013/145548
Kind Code:
A1
Abstract:
The present invention provides a method of producing hollow particles for reducing light scattering in an antireflection coating. This method includes synthesizing core-shell particles including a core containing an organic compound as a major component and a shell containing an inorganic-based compound as a major component in an aqueous medium, dispersing the core-shell particles in an organic solvent, and preparing hollow particles by heating the core-shell particles dispersed in the organic solvent to remove the core therefrom.
Inventors:
KAMENO YU (JP)
Application Number:
PCT/JP2013/001114
Publication Date:
October 03, 2013
Filing Date:
February 26, 2013
Export Citation:
Assignee:
CANON KK (JP)
International Classes:
B01J13/14; B01J13/02; B01J13/18; B01J13/20; B01J13/22; C01B33/00; C09D1/00; C09D5/00; G02B1/11; G02B1/111
Foreign References:
| EP2351707A1 | 2011-08-03 | |||
| US20070036705A1 | 2007-02-15 | |||
| US20090004418A1 | 2009-01-01 | |||
| EP2386590A1 | 2011-11-16 | |||
| US20100204342A1 | 2010-08-12 | |||
| JPH0446921B2 | 1992-07-31 | |||
| JP2009234848A | 2009-10-15 |
Other References:
TISSOT I ET AL: "SiOH-Functionalized Polystyrene Latexes. A Step toward the Synthesis of Hollow Silica Nanoparticles", CHEMISTRY OF MATERIALS, AMERICAN CHEMICAL SOCIETY, WASHINGTON, US, vol. 14, no. 3, 13 February 2002 (2002-02-13), pages 1325 - 1331, XP002408725, ISSN: 0897-4756, DOI: 10.1021/CM0112441
Attorney, Agent or Firm:
ABE, Takuma et al. (30-2 Shimomaruko 3-chome, Ohta-k, Tokyo 01, JP)
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