Title:
METHOD FOR PRODUCING MICROSTRUCTURE
Document Type and Number:
WIPO Patent Application WO/2011/046169
Kind Code:
A1
Abstract:
The disclosed method for producing a microstructure can form a complicated three-dimensionally formed microstructure with few steps. A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern (22) from the photosensitive resin (42). Additionally, by means of integrally rotating the photosensitive resin (42) and the first mask pattern (22) around a central axis (Z) that passes through the photosensitive resin (42) and the first mask pattern (22), and at the same time radiating exposure light from the reverse side of the second mask pattern (32) from the photosensitive resin (42) and the first mask pattern (22) in a direction that is inclined obliquely with respect to the direction of the central axis (Z), the light beam of the exposure light that is transmitted through the light transmitting section of the second mask pattern (32) and the light transmitting section of the first mask pattern (22) exposes the photosensitive resin (42).
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Inventors:
SUZUKI TAKAAKI (JP)
KOTERA HIDETOSHI (JP)
KANNO ISAKU (JP)
HIRAMARU DAISUKE (JP)
KOTERA HIDETOSHI (JP)
KANNO ISAKU (JP)
HIRAMARU DAISUKE (JP)
Application Number:
PCT/JP2010/068047
Publication Date:
April 21, 2011
Filing Date:
October 14, 2010
Export Citation:
Assignee:
UNIV KYOTO (JP)
UNIV KAGAWA (JP)
SUZUKI TAKAAKI (JP)
KOTERA HIDETOSHI (JP)
KANNO ISAKU (JP)
HIRAMARU DAISUKE (JP)
UNIV KAGAWA (JP)
SUZUKI TAKAAKI (JP)
KOTERA HIDETOSHI (JP)
KANNO ISAKU (JP)
HIRAMARU DAISUKE (JP)
International Classes:
G03F7/20; B81C1/00
Domestic Patent References:
| WO2009044901A1 | 2009-04-09 | |||
| WO2006098430A1 | 2006-09-21 |
Foreign References:
| JPH06176408A | 1994-06-24 | |||
| JPH10305670A | 1998-11-17 | |||
| JP2008129558A | 2008-06-05 | |||
| JP2007501951A | 2007-02-01 | |||
| JPH09283434A | 1997-10-31 | |||
| JPH06509530A | 1994-10-27 |
Other References:
MANHEE HAN ET AL.: "3D microfabrication with inclined/rotated UV lithography", SENSORS AND ACTUATORS A, vol. 111, no. ISS.1, 2004, pages 14 - 20, XP004489316, DOI: doi:10.1016/j.sna.2003.10.006
KEI HANAI ET AL: "Three Dimensional Fabrication by Inclined Rotary Exposure", THE TRANSACTIONS OF THE INSTITUTE OF ELECTRICAL ENGINEERS OF JAPAN E, vol. 126, no. 6, 2006, pages 222 - 227
KEI HANAI ET AL: "Three Dimensional Fabrication by Inclined Rotary Exposure", THE TRANSACTIONS OF THE INSTITUTE OF ELECTRICAL ENGINEERS OF JAPAN E, vol. 126, no. 6, 2006, pages 222 - 227
Attorney, Agent or Firm:
YAMAMOTO TOSHINORI (JP)
Toshinori Yamamoto (JP)
Toshinori Yamamoto (JP)
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