Title:
METHOD FOR PRODUCING OLIGOSILANE
Document Type and Number:
WIPO Patent Application WO/2016/027743
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a method for producing an oligosilane, particularly addresses the problem of improving the yield/selectivity of the oligosilane to provide a method for producing the oligosilane with higher efficiency and at a lower temperature. A dehydrogenation condensation reaction of hydrosilane is carried out in the presence of zeolite that has pores each having a shorter diameter of 0.43 nm or longer and a longer diameter of 0.69 nm or shorter, whereby it becomes possible to improve the selectivity for the oligosilane, particularly the selectivity for disilane, and therefore produce the oligosilane at a lower temperature and with higher efficiency.
Inventors:
ISHIHARA YOSHIMITSU (JP)
HAMADA HIDEAKI (JP)
SHIMADA SHIGERU (JP)
SATO KAZUHIKO (JP)
IGARASHI MASAYASU (JP)
UCHIDA HIROSHI (JP)
HAMADA HIDEAKI (JP)
SHIMADA SHIGERU (JP)
SATO KAZUHIKO (JP)
IGARASHI MASAYASU (JP)
UCHIDA HIROSHI (JP)
Application Number:
PCT/JP2015/072854
Publication Date:
February 25, 2016
Filing Date:
August 12, 2015
Export Citation:
Assignee:
NAT INST OF ADVANCED IND SCIEN (JP)
SHOWA DENKO KK (JP)
SHOWA DENKO KK (JP)
International Classes:
C01B33/04; B01J29/40; B01J29/44; B01J29/46; B01J29/70; B01J29/74
Foreign References:
| JP2013506541A | 2013-02-28 | |||
| JPH03183613A | 1991-08-09 | |||
| US20030017092A1 | 2003-01-23 | |||
| JPS60156554A | 1985-08-16 |
Attorney, Agent or Firm:
HIRAKAWA, Akira et al. (JP)
Hirakawa 明 (JP)
Hirakawa 明 (JP)
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