Title:
METHOD FOR PRODUCING POLARIZING PLATE
Document Type and Number:
WIPO Patent Application WO/2021/049216
Kind Code:
A1
Abstract:
[Problem] To provide a method for producing a polarizing plate configured such that, when subjected to a heat shock test in which a low-temperature (-40°C) condition and a high-temperature (85°C) condition are repeated, the occurrence of cracking is suppressed and no iodine is lost in a region that includes end portions. [Solution] A method for producing a polarizing plate, the method comprising: a first layering step for layering an optical film on at least one side of a polarizer having a thickness of 15 µm or less to produce a first layered body; and a humidifying step for leaving the first layered body in a gas phase having a relative humidity of 75% RH or greater at a temperature of 35°C or greater.
Inventors:
KOBAYASHI NAOKO (JP)
Application Number:
PCT/JP2020/030138
Publication Date:
March 18, 2021
Filing Date:
August 06, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
G02B5/30; G02F1/1335; H01L27/32; H01L51/50; H05B33/02
Domestic Patent References:
| WO2018139358A1 | 2018-08-02 | |||
| WO2016093278A1 | 2016-06-16 |
Foreign References:
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Attorney, Agent or Firm:
NAKAYAMA, Tohru et al. (JP)
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