Title:
METHOD FOR PRODUCING POROUS POLYTETRAFLUOROETHYLENE FILM AND POROUS POLYTETRAFLUOROETHYLENE FILM
Document Type and Number:
WIPO Patent Application WO/2015/002002
Kind Code:
A1
Abstract:
Provided is a method for producing a porous polytetrafluoroethylene film which exhibits excellent chemical resistance and heat resistance, and has high porosity and excellent dimensional stability. This method for producing a porous polytetrafluoroethylene film is characterized by including: a stretching step for forming a porous fluorine resin film by stretching a fluorine-resin sheet-shaped molded body having polytetrafluoroethylene as the principal component thereof in the vertical and/or horizontal direction at a temperature below the melting point of the fluorine resin; and an annealing step for, after the stretching step, holding the porous fluorine resin film in a shape-setting state for 1-20 hours at a temperature below the melting point of the fluorine resin but not colder than 30°C below the melting point thereof.
Inventors:
HAYASHI FUMIHIRO (JP)
TSUJIWAKI HIROYUKI (JP)
MURATA AYA (JP)
UNO ATSUSHI (JP)
TSUJIWAKI HIROYUKI (JP)
MURATA AYA (JP)
UNO ATSUSHI (JP)
Application Number:
PCT/JP2014/066556
Publication Date:
January 08, 2015
Filing Date:
June 23, 2014
Export Citation:
Assignee:
SUMITOMO ELEC FINE POLYMER INC (JP)
International Classes:
B01D71/36; C08J9/00
Domestic Patent References:
WO2008018400A1 | 2008-02-14 | |||
WO2010092938A1 | 2010-08-19 |
Foreign References:
JPH03174452A | 1991-07-29 | |||
JP2010094579A | 2010-04-30 | |||
JP2012045524A | 2012-03-08 | |||
JP2011052175A | 2011-03-17 |
Other References:
See also references of EP 3017861A4
Attorney, Agent or Firm:
NISHIMA, Hideaki et al. (JP)
Hideaki Futajima (JP)
Hideaki Futajima (JP)
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