Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD FOR PRODUCING SALT, METHOD FOR PRODUCING ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/053977
Kind Code:
A1
Abstract:
The present invention provides a method for producing a salt (P) of an organic cation and an organic anion, the method comprising: (1) a step for obtaining a product which contains the salt (P) by subjecting a salt (I) of the organic cation and a halide ion to anion exchange; (2) a step for obtaining the molar ratio X of the salt (I) to the salt (P) by applying a potentiometric titration method using an aqueous solution of silver nitrate to the product; and (3) a step for determining whether or not the purity of the salt (P) meets a specific standard on the basis of the molar ratio X.

Inventors:
KANEKO AKIHIRO (JP)
KOJIMA MASAFUMI (JP)
GOTO AKIYOSHI (JP)
Application Number:
PCT/JP2022/034485
Publication Date:
April 06, 2023
Filing Date:
September 14, 2022
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJIFILM CORP (JP)
International Classes:
C07C25/02; C07C309/05; C07C309/12; C07C309/17; C07C309/29; C07C309/42; C07C311/50; C07C381/12; C07D307/00; C07D317/44; C07D327/06; C07D333/46; C07D333/76; C07D405/04; C07D493/16; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
WO2021039331A12021-03-04
WO2011052327A12011-05-05
WO2000008525A12000-02-17
Foreign References:
JP2002167340A2002-06-11
JPH0912537A1997-01-14
Attorney, Agent or Firm:
KOH-EI PATENT FIRM, P.C. (JP)
Download PDF: