Title:
METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/132744
Kind Code:
A1
Abstract:
The disclosed method for producing a semiconductor device is characterized by being provided with a step for forming a mask (31) by applying a masking ink (24) to a semiconductor substrate (10), and a step for forming diffusion layers (12, 13), and by containing at least one step of: a step for heating the masking ink (24) at at least one timing of before, during, or after the application of the masking ink (24); and a step for photoirradiating the masking ink (24).
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Inventors:
KOHIRA MASATSUGU
Application Number:
PCT/JP2011/059845
Publication Date:
October 27, 2011
Filing Date:
April 21, 2011
Export Citation:
Assignee:
SHARP KK (JP)
KOHIRA MASATSUGU
KOHIRA MASATSUGU
International Classes:
H01L21/22; H01L21/225; H01L21/383; H01L31/04
Domestic Patent References:
| WO2007020833A1 | 2007-02-22 |
Foreign References:
| JPH0653135A | 1994-02-25 | |||
| JP2007049079A | 2007-02-22 |
Attorney, Agent or Firm:
Fukami Patent Office, p. c. (JP)
Patent business corporation Fukami patent firm (JP)
Patent business corporation Fukami patent firm (JP)
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Claims: