Title:
METHOD FOR PRODUCING THIN FILM, AND LAMINATE
Document Type and Number:
WIPO Patent Application WO/2021/014706
Kind Code:
A1
Abstract:
The present disclosure provides a novel technique for producing a thin film of a titanium-containing oxide containing a hydride ion, and a novel laminate furnished with the thin film and a substrate. The present disclosure is a method for producing a thin film, the method being furnished with a step for forming the thin film on a substrate using a target. Here, the target is configured from a mixture including a first material and a second material. The first material has a composition represented by ATiO3 (A is at least one selected from the group consisting of Ab and Sr). The second material has a composition represented by EH2 (E is at least one selected from the group consisting of Ti and Zr). The thin film is configured from a first oxide including A, Ti, and O, and a portion of the oxide ion included in the first oxide is substituted by a hydride ion.
Inventors:
KANOU MANABU
ZENITANI YUJI
NAKATA YUKI
ZENITANI YUJI
NAKATA YUKI
Application Number:
PCT/JP2020/018055
Publication Date:
January 28, 2021
Filing Date:
April 28, 2020
Export Citation:
Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
C01G23/00; B32B9/00; B32B18/00; C01B6/24; C23C14/08
Domestic Patent References:
| WO2013008705A1 | 2013-01-17 |
Foreign References:
| JPH07300397A | 1995-11-14 |
Attorney, Agent or Firm:
KAMATA Kenji et al. (JP)
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