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Patent Searching and Data


Title:
METHOD FOR PRODUCING TITANIUM METAL
Document Type and Number:
WIPO Patent Application WO/2010/137688
Kind Code:
A1
Abstract:
Disclosed is a method for producing titanium metal, which comprises: (a) a step in which a mixed gas is formed by supplying titanium tetrachloride and magnesium into a mixing space that is held at an absolute pressure of 50-500 kPa and at a temperature not less than 1700˚C; (b) a step in which the mixed gas is introduced into a deposition space; (c) a step in which titanium metal is deposited and grown on a substrate for deposition; and (d) a step in which the mixed gas after the step (c) is discharged. In this connection, the deposition space has an absolute pressure of 50-500 kPa, the substrate for deposition is arranged in the deposition space, and at least a part of the substrate for deposition is held within the temperature range of 715-1500˚C.

Inventors:
HAN GANG (JP)
UESAKA SHUJIROH (JP)
SHOJI TATSUYA (JP)
ABE MARIKO (JP)
BOULOS MAHER I (CA)
GUO JIAYIN (CA)
JUREWICZ JERZY (CA)
Application Number:
PCT/JP2010/059084
Publication Date:
December 02, 2010
Filing Date:
May 28, 2010
Export Citation:
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Assignee:
HITACHI METALS LTD (JP)
TEKNA PLASMA SYSTEMS INC (CA)
HAN GANG (JP)
UESAKA SHUJIROH (JP)
SHOJI TATSUYA (JP)
ABE MARIKO (JP)
BOULOS MAHER I (CA)
GUO JIAYIN (CA)
JUREWICZ JERZY (CA)
International Classes:
C22B34/12; C22B5/04
Foreign References:
JPS333004B1
JPH03150326A1991-06-26
JPH03150327A1991-06-26
Attorney, Agent or Firm:
ASAMURA Kiyoshi et al. (JP)
Hiroshi Asamura (JP)
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