Title:
METHOD FOR PRODUCING TREATMENT LIQUID
Document Type and Number:
WIPO Patent Application WO/2022/004217
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a method for producing a treatment liquid having excellent filterability. The method for producing a treatment liquid comprises filtering an object to be purified containing a surfactant by using a first filter having a first filter medium to produce a semiconductor substrate treatment liquid, wherein the first filter medium includes at least one selected from the group consisting of nylon, polyallyl sulfonic acid, hydrophilized perfluoroalkoxy alkane, hydrophilized polytetrafluoroethylene, hydrophilized polyolefin, and hydrophilized polyvinylidene fluoride, and the surfactant includes at least one selected from the group consisting of a non-ionic surfactant containing a group represented by formula (1) and an anionic surfactant containing a group represented by formula (1). Formula (1): (LO)n , where L represents an alkylene group, and n represents 3-55.
Inventors:
KAMIMURA TETSUYA (JP)
Application Number:
PCT/JP2021/020446
Publication Date:
January 06, 2022
Filing Date:
May 28, 2021
Export Citation:
Assignee:
FUJIFILM ELECTRONIC MAT CO LTD (JP)
International Classes:
B01D61/14; B01D61/58; B01D71/26; B01D71/32; B01D71/34; B01D71/36; B01D71/56; C11D1/72; C11D1/83; C11D3/30; H01L21/304
Domestic Patent References:
| WO2019022174A1 | 2019-01-31 | |||
| WO2018174147A1 | 2018-09-27 |
Foreign References:
| JP2005239615A | 2005-09-08 | |||
| JP2018199109A | 2018-12-20 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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