Title:
METHOD FOR PRODUCING ULTRA-LOW EXPANSION GLASS
Document Type and Number:
WIPO Patent Application WO/2011/105517
Kind Code:
A1
Abstract:
A method for producing an ultra-low expansion glass, comprising: preparing a TiO2-SiO2 glass ingot having a desired TiO2 concentration; cutting out a sample from the TiO2-SiO2 glass ingot; measuring the OH concentration C(OH), TiO2 concentration C(TiO2) and fictive temperature (TF); calculating the zero-CTE temperature (T) based on the C(OH), C(TiO2) and (TF) having been measured above; examining whether or not the difference (ΔT) between the zero-CTE temperature (T) and the target value falls within a preset range; and, in the case where (ΔT) is inside of the range, referring the TiO2-SiO2 glass ingot as having the desired zero-CTE temperature, or, in the case where (ΔT) is not inside of the range, modifying the conditions for producing the TiO2-SiO2 glass ingot based on the difference (ΔT).
Inventors:
KUSHIBIKI JUNICHI (JP)
ARAKAWA MOTOTAKA (JP)
ARAKAWA MOTOTAKA (JP)
Application Number:
PCT/JP2011/054192
Publication Date:
September 01, 2011
Filing Date:
February 24, 2011
Export Citation:
Assignee:
UNIV TOHOKU (JP)
KUSHIBIKI JUNICHI (JP)
ARAKAWA MOTOTAKA (JP)
KUSHIBIKI JUNICHI (JP)
ARAKAWA MOTOTAKA (JP)
International Classes:
C03B20/00; C03C3/06
Domestic Patent References:
| WO2009101949A1 | 2009-08-20 | |||
| WO2009145288A1 | 2009-12-03 |
Foreign References:
| JP2005022954A | 2005-01-27 | |||
| JP2007182367A | 2007-07-19 |
Attorney, Agent or Firm:
NAKAO, Naoki et al. (JP)
Naoki Nakao (JP)
Naoki Nakao (JP)
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Claims: