Title:
METHOD FOR PRODUCING YTTRIUM OXIDE-CONTAINING FILM
Document Type and Number:
WIPO Patent Application WO/2021/065646
Kind Code:
A1
Abstract:
The present invention is a method for producing a yttrium oxide-containing film by means of an atomic layer deposition method, said method for producing a yttrium oxide-containing film comprising: a step wherein a starting material gas obtained by vaporizing a thin film forming starting material that contains tris(sec-butylcyclopentadienyl)yttrium is introduced into a processing atmosphere, thereby having the tris(sec-butylcyclopentadienyl)yttrium deposit on a base material; and a step wherein yttrium is oxidized by causing the tris(sec-butylcyclopentadienyl)yttrium deposited on the base material and a reactive gas that contains a gas selected from the group consisting of oxygen plasma, ozone, ozone plasma and mixtures thereof to react with each other in the processing atmosphere.
Inventors:
NISHIDA AKIHIRO (JP)
YAMASHITA ATSUSHI (JP)
YAMASHITA ATSUSHI (JP)
Application Number:
PCT/JP2020/035926
Publication Date:
April 08, 2021
Filing Date:
September 24, 2020
Export Citation:
Assignee:
ADEKA CORP (JP)
International Classes:
C23C16/18; C23C16/40; C23C16/455; H01L21/31; H01L21/316
Domestic Patent References:
| WO2019051302A1 | 2019-03-14 |
Foreign References:
| JP2018168398A | 2018-11-01 | |||
| JP2005068074A | 2005-03-17 | |||
| JP2004100003A | 2004-04-02 | |||
| JP2018168398A | 2018-11-01 | |||
| JP2008274374A | 2008-11-13 |
Other References:
ECS TRANSACTIONS, vol. 50, no. 13, 2012, pages 107 - 116
Attorney, Agent or Firm:
SOGA, Michiharu et al. (JP)
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