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Title:
METHOD FOR PRODUCING YTTRIUM OXIDE-CONTAINING FILM
Document Type and Number:
WIPO Patent Application WO/2021/065646
Kind Code:
A1
Abstract:
The present invention is a method for producing a yttrium oxide-containing film by means of an atomic layer deposition method, said method for producing a yttrium oxide-containing film comprising: a step wherein a starting material gas obtained by vaporizing a thin film forming starting material that contains tris(sec-butylcyclopentadienyl)yttrium is introduced into a processing atmosphere, thereby having the tris(sec-butylcyclopentadienyl)yttrium deposit on a base material; and a step wherein yttrium is oxidized by causing the tris(sec-butylcyclopentadienyl)yttrium deposited on the base material and a reactive gas that contains a gas selected from the group consisting of oxygen plasma, ozone, ozone plasma and mixtures thereof to react with each other in the processing atmosphere.

Inventors:
NISHIDA, Akihiro (2-35 Higashiogu 7-chome, Arakawa-k, Tokyo 54, JP)
YAMASHITA, Atsushi (2-35 Higashiogu 7-chome, Arakawa-k, Tokyo 54, JP)
Application Number:
JP2020/035926
Publication Date:
April 08, 2021
Filing Date:
September 24, 2020
Export Citation:
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Assignee:
ADEKA CORPORATION (Higashiogu 7-chome Arakawa-k, Tokyo 54, JP)
International Classes:
C23C16/18; C23C16/40; C23C16/455; H01L21/31; H01L21/316
Attorney, Agent or Firm:
SOGA, Michiharu et al. (8th Floor Kokusai Building, 1-1, Marunouchi 3-chome, Chiyoda-k, Tokyo 05, JP)
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