METHOD FOR RECYCLING ORGANIC RUTHENIUM COMPOUND FOR CHEMICAL VAPOR DEPOSITION

WIPO Patent Application WO/2013/183703

A1

The present invention is a method for recycling an organic ruthenium compound for chemical vapor deposition, wherein an unreacted organic ruthenium compound is extracted from a used starting material after a thin film formation process, said method comprising the following steps (a)-(c). (a) A modification step wherein the used starting material and a hydrogenation catalyst are brought into contact with each other in a hydrogen atmosphere, thereby hydrogenating an oxidized organic ruthenium compound in the used starting material. (b) An adsorption step wherein the used starting material and an adsorbent are brought into contact with each other, thereby removing impurities in the used starting material. (c) A restoration step wherein the used starting material is heated at a temperature that is lower than the decomposition temperature of the organic ruthenium compound by 10-100°C (inclusive) for 8 hours or more, thereby adjusting the ratio of the isomers of the organic ruthenium compound in the used starting material.

HARADA RYOSUKE (JP)
NABEYA SHUNICHI (JP)
SHIGETOMI TOSHIYUKI (JP)
SAITO MASAYUKI (JP)

PCT/JP2013/065682

December 12, 2013

June 06, 2013

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TANAKA PRECIOUS METAL IND (JP)

C07F15/00; B01J23/44; C07C7/12; C07C7/163; C07C13/263; C07C13/42; C07C45/79; C07C45/85; C07C49/92

WO2011052453A1

2011-05-05

JP2002053961A	2002-02-19
JP2003104994A	2003-04-09
JP2012006858A	2012-01-12
JP2003306472A	2003-10-28
JP2009046720A	2009-03-05

TANAKA AND OKAZAKI (JP)
Patent business corporation Tanaka and Okazaki and associates (JP)

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