Title:
METHOD FOR REDUCING IMPACT OF PHASE GRATING ASYMMETRY ON POSITION MEASUREMENT PRECISION
Document Type and Number:
WIPO Patent Application WO/2022/156249
Kind Code:
A1
Abstract:
A method for reducing impact of phase grating asymmetry on position measurement precision, comprising the following steps: determining an asymmetry change range according to a design value and processing precision of a phase grating, and then determining an asymmetric grating structure; establishing an asymmetric grating simulation model; inputting the asymmetric grating structure into the asymmetric grating simulation model to simulate a position error curve of each diffraction order within the asymmetry change range; and determining the weight of each diffraction order according to the obtained difference in position error of each diffraction order, to reduce the impact of asymmetric changes. Without a need to measure the morphology of a grating, and only by determining a grating asymmetry change range according to processing precision, the impact of asymmetric changes in the range on position measurement precision can be reduced.
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Inventors:
LI JING (CN)
YANG GUANGHUA (CN)
DING MINXIA (CN)
FENG LEI (CN)
ZHU SHIDONG (CN)
YANG GUANGHUA (CN)
DING MINXIA (CN)
FENG LEI (CN)
ZHU SHIDONG (CN)
Application Number:
PCT/CN2021/118791
Publication Date:
July 28, 2022
Filing Date:
September 16, 2021
Export Citation:
Assignee:
INST OF MICROELECTRONICS CAS (CN)
International Classes:
G01B11/00; G03F9/00
Foreign References:
| CN110967948A | 2020-04-07 | |||
| CN112833790A | 2021-05-25 | |||
| CN102460310A | 2012-05-16 | |||
| EP1431833A2 | 2004-06-23 | |||
| CN1879004A | 2006-12-13 |
Other References:
DU JOYOU, DAI FENGZHAO;WANG XIANGZHAO: "Calibration Method for Alignment Error Caused by Asymmetric Deformation of Mark and Its Application in Overlay Measurement", CHINESE JOURNAL OF LASERS, SHANGHAI : SHANGHAI KEXUE JISHU CHUBANSHE, 1983-1992, CN, vol. 46, no. 7, 31 July 2019 (2019-07-31), CN , pages 185 - 192, XP055952793, ISSN: 0258-7025, DOI: 10.3788/CJL201946.0704004
GE YAPING: "Equipment for Electronic Products Manufacturing Model for the Calculation of Alignment Signal and Alignment Error of the Asymmetric Alignment Mark of Phase Grating in the Projection Lithography", EQUIPMENT FOR ELECTRONIC PRODUCTS MANUFACTURING, no. 208, 31 May 2012 (2012-05-31), pages 19 - 23, XP055952795, ISSN: 1004-4507
ZHANG TAO, ZHAO XINGYU, CUI JIWEN, TAN JIUBIN: "Influence of asymmetric grating structures on measurement accuracy in integrated phase grating interference-based metrology", APPLIED OPTICS, OPTICAL SOCIETY OF AMERICA, US, vol. 58, no. 7, 1 March 2019 (2019-03-01), US , pages 1847, XP055952798, ISSN: 1559-128X, DOI: 10.1364/AO.58.001847
BORIS MENCHTCHIKOV, ROBERT SOCHA, SUDHARSHANAN RAGHUNATHAN, IRINA LYULINA, HIELKE SCHOONEWELLE, PATRICK TINNEMANS, PAUL TUFFY, PHI: "Computational scanner wafer mark alignment", PROCEEDINGS OF SPIE, SPIE, 1000 20TH ST. BELLINGHAM WA 98225-6705 USA, vol. 10147, 30 March 2017 (2017-03-30), 1000 20th St. Bellingham WA 98225-6705 USA , pages 101471C, XP055526408, ISBN: 978-1-5106-2099-5, DOI: 10.1117/12.2259750
GE YAPING: "Equipment for Electronic Products Manufacturing Model for the Calculation of Alignment Signal and Alignment Error of the Asymmetric Alignment Mark of Phase Grating in the Projection Lithography", EQUIPMENT FOR ELECTRONIC PRODUCTS MANUFACTURING, no. 208, 31 May 2012 (2012-05-31), pages 19 - 23, XP055952795, ISSN: 1004-4507
ZHANG TAO, ZHAO XINGYU, CUI JIWEN, TAN JIUBIN: "Influence of asymmetric grating structures on measurement accuracy in integrated phase grating interference-based metrology", APPLIED OPTICS, OPTICAL SOCIETY OF AMERICA, US, vol. 58, no. 7, 1 March 2019 (2019-03-01), US , pages 1847, XP055952798, ISSN: 1559-128X, DOI: 10.1364/AO.58.001847
BORIS MENCHTCHIKOV, ROBERT SOCHA, SUDHARSHANAN RAGHUNATHAN, IRINA LYULINA, HIELKE SCHOONEWELLE, PATRICK TINNEMANS, PAUL TUFFY, PHI: "Computational scanner wafer mark alignment", PROCEEDINGS OF SPIE, SPIE, 1000 20TH ST. BELLINGHAM WA 98225-6705 USA, vol. 10147, 30 March 2017 (2017-03-30), 1000 20th St. Bellingham WA 98225-6705 USA , pages 101471C, XP055526408, ISBN: 978-1-5106-2099-5, DOI: 10.1117/12.2259750
Attorney, Agent or Firm:
CHINA SCIENCE PATENT & TRADEMARK AGENT LTD. (CN)
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