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Title:
METHOD FOR REMOVING ARSENIC AND IRON FROM ACIDIC WASTE SOLUTION GENERATED DURING ETCHING OF PRINTED CIRCUIT BOARDS
Document Type and Number:
WIPO Patent Application WO/2010/009611
Kind Code:
A1
Abstract:
A method for removing arsenic and iron from acidic waste solution generated during etching of printed circuit boards is provided, which involves the following steps: (1) Hydrated titanium dioxide is stirred in pulp. (2) The pH value of acidic waste solution generated during etching of printed circuit boards is adjusted to 0.5-3.0. (3) The hydrated titanium dioxide pulp is added to the acidic waste solution generated during etching of printed circuit boards with the adjusted pH value, stir-reacted for 5-45 minutes, and filtered. The method enables economical and effective removal of arsenic and iron simultaneously.

Inventors:
SONG CHUANJING (CN)
CHEN ZHICHUAN (CN)
CHEN CHANGMING (CN)
MAO ANZHANG (CN)
CHENG BAISEN (CN)
Application Number:
PCT/CN2009/000807
Publication Date:
January 28, 2010
Filing Date:
July 20, 2009
Export Citation:
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Assignee:
SHENZHEN HAZARDOUS WASTE TREAT (CN)
SONG CHUANJING (CN)
CHEN ZHICHUAN (CN)
CHEN CHANGMING (CN)
MAO ANZHANG (CN)
CHENG BAISEN (CN)
International Classes:
C02F1/58; C02F1/64; C02F1/66; C02F9/04
Domestic Patent References:
WO2006087432A12006-08-24
Foreign References:
CN1872727A2006-12-06
CN101323475A2008-12-17
CN101215062A2008-07-09
Attorney, Agent or Firm:
SHENZHEN ZHONGZHI PATENT & TRADEMARK AGENT CO., LTD. (No. 1001 Shangbu Zhong RoadShenzhen, Guangdong 1, CN)
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