Title:
METHOD FOR REMOVING IMPURITIES INSIDE VACUUM CHAMBER, METHOD OF USING VACUUM DEVICE, AND METHOD OF MANUFACTURING PRODUCT
Document Type and Number:
WIPO Patent Application WO/2013/187026
Kind Code:
A1
Abstract:
Provided are a method for removing impurities inside a vacuum chamber and a method of using a vacuum device which is able to remove impurities inside a vacuum chamber. The method of using a vacuum device includes a vacuum chamber (2) housing an object, and a pump (3) for reducing the pressure inside the vacuum chamber (2). Gas is introduced into the vacuum chamber (2), and the pressure is reduced inside the vacuum chamber (2) using the pump (3) to discharge the gas from the vacuum chamber (2). This method includes a ventilation process for ventilating the vacuum chamber (2). During the ventilation process, the rate per unit volume at which the molecules of gas are exhausted is equal to or greater than 3.3 × 10-5 [mol/(sec·L)], and the temperature inside the vacuum chamber is in a range from 15[ºC] to 80[ºC].
Inventors:
KAWANAMI YUKO
Application Number:
PCT/JP2013/003562
Publication Date:
December 19, 2013
Filing Date:
June 06, 2013
Export Citation:
Assignee:
PANASONIC CORP (JP)
International Classes:
B01J3/00; B01J3/02; H01L51/50; H05B33/10
Domestic Patent References:
| WO2010098023A1 | 2010-09-02 |
Foreign References:
| JPH07227533A | 1995-08-29 | |||
| JP2008081673A | 2008-04-10 | |||
| JPH03106432A | 1991-05-07 | |||
| JPH0663380A | 1994-03-08 |
Attorney, Agent or Firm:
NAKAJIMA, Shiro et al. (JP)
Shiro Nakajima (JP)
Shiro Nakajima (JP)
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